Ventilation system and method of using

专利名称：Ventilation system and method of using发明人：Mu-Tsang Lin,Yu-Chih Liou,Tu-Yi Chiu,Ji-Liang

Wu,Wie-Liang Tsai

申请号：US101858申请日：20020627

公开号：US20040002299A1公开日：20040101

专利附图：

摘要：The present invention provides a ventilation system and method that operatesto remove outgassing of chemicals formed on a wafer during a wafer fabrication processto prevent contamination in a sealed wafer handling chamber. More particularly, the

present invention discloses a ventilation system having a hood body having a gas supplyconduit attached to a sealed outer side chamber of the ventilation hood such thatcontaminating particles in an interior of the hood are carried out by a purge gas flowninto the hood interior through an inlet of the hood connected to the gas supply conduitinto a facility vacuum exhaust system attached to an outlet of the hood. Preferably, thechamber is a load-lock chamber that operates to perform load lock processing on wafersand further operates to load and unload wafers to another location for furtherprocessing after using the ventilation system.

申请人：TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

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