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Electro chemical deposition systems and methods of

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专利名称：Electro chemical deposition systems and

methods of manufacturing using the same

发明人：Moosung Chae,Bum Ki Moon,Sunoo

Kim,Danny Pak-Chum Shum

申请号：US13452298申请日：20120420公开号：US08636879B2公开日：20140128

专利附图：

摘要：An electro chemical deposition system is described for forming a feature on asemiconductor wafer. The electro chemical deposition is performed by powering

electrodes that includes a cathode, an anode and a plurality of electrically independentauxiliary electrodes.

申请人：Moosung Chae,Bum Ki Moon,Sunoo Kim,Danny Pak-Chum Shum

地址：Poughkeepsie NY US,LaGrangeville NY US,Hopewell Junction NYUS,Poughkeepsie NY US

国籍：US,US,US,US

代理机构：Slater & Matsil, L.L.P.

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