专利名称：Exposure apparatus and exposure method
using the same
发明人：Jae-Weon Hur,Hong-Yeon Lee,Baek-Kyun
Jeon
申请号：US14453040申请日：20140806公开号：US09791783B2公开日：20171017
专利附图：
摘要：An exposure apparatus including a substrate transporting unit configured totransport a substrate in a first direction, and including a first measuring part; and an
exposure part disposed over the substrate transporting unit configured to irradiate thesubstrate with ultraviolet rays. The first measuring part is configured to measure anintensity of the ultraviolet rays before the substrate is irradiated.
申请人：Samsung Display Co., Ltd.
地址：Yongin KR
国籍：KR
代理机构：H.C. Park & Associates, PLC
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