Compositions for use in the production of integrat

专利名称：Compositions for use in the production of

integrated circuits and method for itspreparation and use

发明人：David J. Lapham,Geoffrey Hitchmough申请号：US07/287520申请日：19881219公开号：US04917122A公开日：19900417

摘要：A photoresist stripping solution is prepared by adding hydrogen peroxide toconcentrated sulphuric acid under controlled temperature conditions, preferably atbelow 20° C. The concentration of the sulphuric acid in the solution is preferablymaintained at at least 80% wt to maximize the concentration of the active strippingspecies permonosulphuric acid. Stripping solutions having extended storage life have acontent of soluble tim compound preferably sodium stannate and preferalby also aphosphonate sequestrant which shows a synergism with the tin compound. Suchextended life solutions also preferably have a low content of transition metals and ofparticles. The stripping solution may be utilized at ambient temperature.

申请人：MICRO-IMAGE TECHNOLOGY LIMITED

代理机构：Kane, Dalsimer, Sullivan, Kurucz, Levy, Eisele and Richard

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