NANOFABRICATION INSTALLATION AND PROCESS

专利名称：NANOFABRICATION INSTALLATION AND

PROCESS

发明人：GIERAK, JACQUES申请号：EP07730998.7申请日：20070216公开号：EP1987530B1公开日：20120411

摘要：The installation has a mask (8) provided for formation of a sample (4). The maskcomprises an electrode placed on a lower side of the mask and provided at the level of atraversing opening (10), for electrical interaction with nanoclusters e.g. gold clusters,passing through a surface (4a) of the sample. The electrode is provided close to theopening, so that electrons are emitted on arrival of the clusters on the surface of thesample, if the clusters are positively charged. A generator applies an adjustable electricvoltage to the electrode. An independent claim is also included for a nanofabricationmethod.

申请人：CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS),CENTRE NATRECH SCIENT,CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)

地址：FR

国籍：FR

代理机构：Cabinet Plasseraud

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